Imalion - Creation and Low Energy Transportation of a Milliampere Metal Ion Beam
نویسنده
چکیده
IMALION which stands for IMplantation of ALuminum IONs is a facility designed for high-current metal ion beam implantation and surface modification such as in semiconductor, medical or optical industry. IMALION is a newly developed 30 kV metal ion wide area implantation platform, which is suitable for the irradiation of a target width of 200 mm to produce homogeneous implantation profiles over the entire surface. Electrostatic and magnetic beamline elements such as a deflector as well as analyzing and parallelization magnets were designed for precision guiding of a milliampere metal ion beam. The implanter is fed by a novel ECR metal ion source, which is equipped with an integrated cylindrical sputter magnetron as metal vapor supply. Stable operation of the sputter magnetron under ECR magnetic mirror conditions was proven by optical emission spectroscopy and Langmuir probe measurements.
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